Pulsed helium ion beam induced deposition: A means to high growth rates
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چکیده
منابع مشابه
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ژورنال
عنوان ژورنال: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
سال: 2011
ISSN: 2166-2746,2166-2754
DOI: 10.1116/1.3656347